Metal film thickness measuring unit (micron meter)
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Date
1970-07
Authors
Cockbaine, D. R.
Journal Title
Journal ISSN
Volume Title
Publisher
T.C. Atom Enerjisi Komisyonu, Ankara Nükleer Araştırma Merkezi
Abstract
This report describes a simple unit to measure the metal film thickness evaporated on to a substrate. The method is perfectly general and will measure film thicknesses for 0,01 microns to 1 micron with metal specific resistances from 1,5 x 10 cm. to -6 Ω cm. to 500 x 10-6 Ω cm. Since the measuring device is contained
within the evaporation unit, the evaporation process can be stopped whenever the desired film thickness has been reached.
Description
TENMAK D.N.. 8513
Keywords
Thin films, İnce filmler
Citation
Cockbaine, D. R. (1970). Metal film thickness measuring unit (micron meter). Ankara : T.C. Atom Enerjisi Komisyonu, Ankara Nükleer Araştırma Merkezi.