Metallic aluminum particle concentration in aluminum oxide thin films
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Date
1974
Authors
Journal Title
Journal ISSN
Volume Title
Publisher
T.A.E.C., Çekmece Nuclear Research And Training Center
Abstract
Two different methods based on (a) the tunneling junction model and (b) the optical model are used to determine the metallic aluminum particle concentration in aluminum oxide thin films prepared by thermal evaporation of pure aluminum under appropriate vacuum conditions. The concentration determined from these two models agree with each other at high concentrations and show considerable deviation at low concentrations.
Description
TENMAK D.N.. 10325
Keywords
Thin films, İnce filmler, Aluminum oxide, Alüminyum oksit, Alumina, Alüminyum
Citation
Birey, H. (1974). Metallic aluminum particle concentration in aluminum oxide thin films. İstanbul : T.A.E.C., Çekmece Nuclear Research And Training Center.