Channeling of low energy protons in Si <111> crystal

dc.contributor.authorBölükbaşı, O.
dc.contributor.authorSanalan, Yalçın
dc.contributor.departmentBölüm Yoktr_TR
dc.date.accessioned2022-06-14T12:32:53Z
dc.date.available2022-06-14T12:32:53Z
dc.date.issued1982-08
dc.description.abstract(111) düzlemine paralel kesilmiş silikon tek-kristalinde, Rutherford geri saçılma tekniği kullanılarak, kanallarıma olayı incelendi. 325, 395 ve 400 keV enerjili protonlar için kritik açılar ölçüldü ve deneysel olarak bulunan parametreler Lindhard'm basit süreklilik modeli hesaplamalarıyla karşılaştırıldı .tr_TR
dc.description.abstractChanneling effect on a silicon single-crystal wafer cut along parallel to its (111) plane was investigated by using Rutherford Back-scattering Technique. Critical angles were measured for 325, 395 and 400 keV incoming proton energies. Experimentally measured parameters were compared to Lindhard's simple continuoum model calculations.tr_TR
dc.identifier.citationBölükbaşı, O. ve Sanalan, Y. (1982). Channeling of low energy protons in Si <111> crystal. Turkish Journal of Nuclear Sciences, 9(2), 52-63.tr_TR
dc.identifier.endpage63tr_TR
dc.identifier.issue2tr_TR
dc.identifier.startpage52tr_TR
dc.identifier.urihttp://kurumsalarsiv.tenmak.gov.tr/handle/20.500.12878/1878
dc.identifier.volume9tr_TR
dc.language.isoengtr_TR
dc.publisherTurkish Atomic Energy Commissiontr_TR
dc.relation.journalTurkish Journal of Nuclear Sciencestr_TR
dc.rightsinfo:eu-repo/semantics/openAccesstr_TR
dc.subjectSi <111> crystaltr_TR
dc.subjectSi <111> kristalitr_TR
dc.subjectChannelingtr_TR
dc.subjectKanallamatr_TR
dc.subjectLow energy protonstr_TR
dc.subjectDüşük enerjili protonlartr_TR
dc.titleChanneling of low energy protons in Si <111> crystaltr_TR
dc.typearticletr_TR
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