Material thickness measurements of thin films using proton backscattering
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Date
1979-10
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Publisher
Turkish Atomic Energy Commission, Ankara Nuclear Research and Traning Center
Abstract
0.5 MeV Van de Graaff hızlandırıcısı ve proton geri saçılması tekniği kullanılarak, 0.08- 1.50 mg/cm2 aralığında maddesel kalınlıklar ölçüldü. Sistemin enerji ve kalınlık ayırma gücü sırasıyla 23 KeV ve 0.03 mg/cm2 olarak bulundu. Sonuçlar, deneysel hata sınırları içerisinde, optik interferometre ölçüm sonuçlan ile uyumlu bulundu. Bu teknik özellikle, bir taşıyıcı üzerindeki çok katlı ince film kalınlıklarını filmi bozmadan ölçmede yararlıdır.
Material thicknesses in the range of 0.08- 1.50 mg/cm2 were measured using a 0.5 MeV Van de Graaff accelerator and proton backscattering technique. The energy thickness resolutions of the system were found to be 23 KeV and 0.03 mg/cm2 respectively. Measured thicknesses were in agreement with optical interferometry measurements. within the limits of experimental error. The technique is especially useful for non - destructive measurements of multiple - layer thin film thicknesses on substrates.
Material thicknesses in the range of 0.08- 1.50 mg/cm2 were measured using a 0.5 MeV Van de Graaff accelerator and proton backscattering technique. The energy thickness resolutions of the system were found to be 23 KeV and 0.03 mg/cm2 respectively. Measured thicknesses were in agreement with optical interferometry measurements. within the limits of experimental error. The technique is especially useful for non - destructive measurements of multiple - layer thin film thicknesses on substrates.
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Keywords
Proton backscattering, Proton geri saçılması, Material thickness measurements, Malzeme kalınlık ölçümleri, Thin films, İnce film
Citation
Sanalan, Y. (1979). Material thickness measurements of thin films using proton backscattering. Technical Journal, 6(3), 78-86.